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專利資訊

年度
112
領域
服務創新
執行單位
工研院量測中心
專利名稱
掃描裝置之調校組件與調校系統
計畫名稱
工研院創新前瞻技術研究計畫
專利發明人
黎宇泰,林瑋佑,林家任,連慶,謝卓帆
核准國家
美國
專利性質
發明
獲證日期
20230512
專利期間
20230207~20230207
技術摘要(中)
一種掃描裝置之調校組件包含多個穿透板及一反射板。這些穿透板的尺寸相異且這些穿透板沿其厚度方向排列而呈階梯狀,且依這些穿透板之重疊層數區分成多個穿透區。這些穿透區的穿透度相異,這些穿透區之穿透度與這些穿透板之重疊層數成反比。這些穿透區用以供預定波段的光束穿透。反射板設置於其中一穿透板之厚度方向上的其中一側。反射板具有多個第一鏤空槽,且這些第一鏤空槽的尺寸相異,反射板用以遮擋預定波段的光束。
技術摘要(英)
A adjustment component of a scanning device includes a plurality of penetrating plates and a reflecting plate. The sizes of the penetrating plates are different, and the penetrating plates are arranged in a stepped shape along the thickness direction, and are divided into multiple penetrating areas according to the number of overlapping layers of the penetrating plates. The penetration of these penetrating areas is different, and the penetration of these penetrating areas is inversely proportional to the number of overlapping layers of the penetrating plates. These penetrating areas are used for light beams of predetermined wavelengths to penetrate. The reflecting plate is arranged on one side of the thickness direction of one of the penetrating plates. The reflecting plate has a plurality of first hollow grooves, and the sizes of the first hollow grooves are different, and the reflecting plate is used for shielding light beams of a predetermined waveband.
聯絡人員
趙淑華
電話
03-5918707
傳真
03-5820467
電子信箱
更新日期:2024-08-15

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